Dual beam scanning electron microscope – IQScan FIB55

  • Ultra high resolution electronic column. Super Tunnel™ technology. The trajectory of the electrons does not have a crossover inside the column. Combined electrostatic and electromagnetic objective lens
  • The newest ion column of its own design. Ion beam with high current stability for continuous operation and long-term reproduction of user presets
  • Gas Injection System (GIS). Software integrated into software control, high-precision pneumatic extension system allows to speed up the process significantly
  • Nanomanipulator with piezoceramic drive integrated into software. Precision movement
  • Rich in functionality to expand functionality by installing additional options and detectors such as STEM, EDS, EBSD, etc.
Resolution 0.9 Nm – 15 kV (SE) | 1.6 Nm – 1 kV (SE) | 3nm – 30kV (ion column)
Increase 12x – 2 500 000X
Cathode type Schottky cathode
Ion source type LMIS (GA)
accelerating voltage 20 V – 30 kV (electronic column) | 500 V – 30 kV (ion column)
Detectors SE, IN-LENS, semiconductor four-section BSE
Platen With five degrees of freedom
Table movement range X,Y: 110mm | Z: 65 mm | R: 360° | T: -10° – 70°
Additional options EDS, EBSD, CL, STEM, Gateway, table with heating and cooling, table for physical and mechanical testing, etc.

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